Dry cleaning device for GaN film formation equipment fixtures
Introduction to the dry cleaning device for GaN film deposition equipment fixtures.
Ideal for dry cleaning various jigs used in GaN film deposition equipment.
- Company：メープル
- Price：Other
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Dry cleaning device for GaN film deposition equipment fixtures 【Free demo available!】
Dry cleaning extends the life of jigs and reduces costs! Significant time savings compared to wet cleaning!
The dry cleaning device for GaN film deposition equipment is a system that cleans GaN and AlN deposited during the film formation process, such as on fixtures of MO-CVD equipment, using a dry etching method. It is ideal for the production of compound semiconductors like power devices and laser diodes, as well as blue LEDs. It effectively improves product yield during manufacturing and reduces running costs. ★☆★【Free Demo】Now Available!!★☆★ 【Features】 ● Optimal for dry cleaning of various fixtures used in GaN film deposition equipment ● Cleanable fixtures include SiC coated carbon, quartz, etc. ● Dummy wafers with sapphire substrates can also be cleaned. ● No need for expensive large quantities of spare parts required for wet cleaning ● The introduction of this device can contribute to reducing maintenance costs! ● Safety design that does not burden the operator. ★If you would like a 【Free Demo】, please contact us through the ≪Inquiry≫ form★
- Company：メープル
- Price：Other
Dry cleaning device "MDC8540L" for GaN film deposition equipment fixtures
【Free demo available!】 Achieve significant cost reduction with newly developed, high-performance design! It also reduces the burden on workers.
The "MDC8540L" is the flagship model of the MDC series, designed for cleaning fixtures used in the manufacturing of compound semiconductors such as power devices, blue laser diodes, and blue LEDs, employing a dry etching method to clean GaN, AlN, and other materials that accumulate during film deposition. It is ideal for improving product yield during mass production and reducing running costs. 【Features】 - Optimal for dry cleaning various fixtures used in GaN and AlN deposition equipment - Cleanable fixtures include SiC-coated carbon susceptors, quartz fixtures, etc. - Sapphire substrates of dummy wafers can also be cleaned - No need for wet cleaning or a large number of spare parts - Reduction in maintenance costs due to the introduction of this equipment - Safe design that does not burden operators ● For more details, please download the catalog or contact us.
- Company：メープル
- Price：Other
